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Client #107

Electronics

Microelectronics Mfr

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Project Number 1

Summary:

After initial testing several products showed good results in removing the negative photoresist.

Test Objective:

To replace Xylene in cup cleaning operation (and preferably use of an non-voc)

Product Use:

To collect excess photoresist from wafers (silicone)
Trial Number Date Run Purpose Success Rating
0 06/15/1999 To find a replacement for xylene in cleaning negative photoresist from equipment used to coat wafers. Results successful using TACT (time, agitation, concentration, and temperature, as well as rinsing and drying) and/or other cleaning chemistries examined.
1 06/17/1999 To determine if a longer soak would aid in the removal of the contaminant. A follow up test, usually based on company input.
2 06/18/1999 To determine if a longer soak and increase concentrations would aid in the removal of the contaminant. Results suggest a scale-up feasible match for cleaning chemistry and equipment. Pilot plant study with actual parts recommended.
3 06/25/1999 To evaluate successful cleaner on actual parts. A follow up test, usually based on company input.
4 07/20/1999 To evaluate successful cleaner on actual parts. Results suggest a scale-up feasible match for cleaning chemistry and equipment. Pilot plant study with actual parts recommended.
5 07/29/1999 To determine if previous tested cleaners could work at lower dilutions using immersion or ultrasonic cleaning. A follow up test, usually based on company input.

Project Number 2

Test Objective:

To switch to a less odorous cleaner.

Product Use:

microelectronic systems
Trial Number Date Run Purpose Success Rating
0 07/28/2011 To evaluate cleaners for their effectiveness in removing lead and lead free solder on electronic parts with low odor. Results successful using TACT (time, agitation, concentration, and temperature, as well as rinsing and drying) and/or other cleaning chemistries examined.
1 10/13/2011 Further evaluation on reduced odor cleaning products Results successful using TACT (time, agitation, concentration, and temperature, as well as rinsing and drying) and/or other cleaning chemistries examined.